Research Progress on High Resolution Extreme Ultraviolet Photoresist

doi:10.19894/j.issn.1000-0518.210221

Chinese Journal of Applied Chemistry ›› 2021, Vol. 38 ›› Issue (9): 1138-1153.DOI: 10.19894/j.issn.1000-0518.210221

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Research Progress on High Resolution Extreme Ultraviolet Photoresist

GAO Jia-Xing^1,3, CHEN Long^1,3, YU Jia-Ting^1,3, GUO Xu-Dong^1,3, HU Rui^1,3, WANG Shuang-Qing^1,3*, CHEN Jin-Ping^2,3, LI Yi^2,3*, YANG Guo-Qiang^1,3*

¹Beijing National Laboratory for Molecular Sciences, CAS Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China
²Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China
³University of Chinese Academy of Sciences, Beijing 100039, China

Received:2021-05-10 Accepted:2021-06-25 Published:2021-09-01 Online:2021-09-06
Supported by:
National Natural Science Foundation of China (Nos.21873106, 21903085, 22073108, U20A20144, 22090012)

Abstract

Abstract: Since the birth of the integrated circuit chip for more than half a century, the chip size has been continuously reduced, and the photolithography technology represented by extreme ultraviolet (EUV) has also developed significantly. At the same time, more advanced photoresist materials are needed to achieve higher precision photolithography patterns. Traditional polymer photoresist materials are limited in their use due to their large relative molecular mass, high-precision stripes and easy collapse. New photoresist materials with small relative molecular mass and uniform structure represented by molecular glass and inorganic metal complex photoresist have been widely developed at home and abroad. This article reviews the current development status and trends of new photoresist materials.

Key words: Extreme ultraviolet lithography, Extreme ultraviolet photoresist, Molecular glass photoresist, Inorganic metal complex photoresist, Lithography

CLC Number:

O644.1

GAO Jia-Xing, CHEN Long, YU Jia-Ting, GUO Xu-Dong, HU Rui, WANG Shuang-Qing, CHEN Jin-Ping, LI Yi, YANG Guo-Qiang. Research Progress on High Resolution Extreme Ultraviolet Photoresist[J]. Chinese Journal of Applied Chemistry, 2021, 38(9): 1138-1153.

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Research Progress on High Resolution Extreme Ultraviolet Photoresist

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