Cover Picture

• Optimization of Development Process for Carbon Dioxide-Based Poly(cyclohexene carbonate) Electron Beam Resist
• LU Xin-Yu, MA Bin-Ze, LUO Hao, QI Huan, LI Qiang, WU Guang-Peng
• Cover Picture 2021, (9): 0-0.
• Abstract ( 996 ) PDF (38692KB)( 1311 )

Preface

• Preface to Special Issue “Photoresist Materials”——Photoresist Materials Facilitate the Production of “China-made Chips”
• JI Sheng-Xiang
• Preface 2021, (9): 1027-1028. DOI:10.19894/j.issn.1000-0518.210412
• Abstract ( 706 ) PDF (508KB)( 702 )

Review

• Advanced Lithography: Directed Self-Assembly
• HU Xiao-Hua, XIONG Shi-Sheng
• Review 2021, (9): 1029-1078. DOI:10.19894/j.issn.1000-0518.210278
• Abstract ( 3452 ) PDF (11532KB)( 1339 )

• Photoresist Film-Forming Agent: Development and Future
• PENG Xiao-Kang, HUANG Xing-Wen, LIU Rong-Tao, ZHANG Yong-Wen, ZHANG Shi-Yang, LIU Yi-Dong, MIN Yong-Gang
• Review 2021, (9): 1079-1090. DOI:10.19894/j.issn.1000-0518.210152
• Abstract ( 916 ) PDF (3806KB)( 1142 )

• Research Progress on g-Line and i-Line Photoresists
• GU Xue-Song, LI Xiao-Ou, LIU Ya-Dong, JI Sheng-Xiang
• Review 2021, (9): 1091-1104. DOI:10.19894/j.issn.1000-0518.210265
• Abstract ( 2287 ) PDF (3477KB)( 2096 )

• Research Progress on Chemically Amplified 193 nm Photoresists
• LI Xiao-Ou, GU Xue-Song, LIU Ya-Dong, JI Sheng-Xiang
• Review 2021, (9): 1105-1118. DOI:10.19894/j.issn.1000-0518.210264
• Abstract ( 1419 ) PDF (2709KB)( 1948 )

• Progress Research on Photosensitive Polyimide
• GUO Hai-Quan, YANG Zheng-Hua, GAO Lian-Xun
• Review 2021, (9): 1119-1137. DOI:10.19894/j.issn.1000-0518.210274
• Abstract ( 2958 ) PDF (3669KB)( 3622 )

• Research Progress on High Resolution Extreme Ultraviolet Photoresist
• GAO Jia-Xing, CHEN Long, YU Jia-Ting, GUO Xu-Dong, HU Rui, WANG Shuang-Qing, CHEN Jin-Ping, LI Yi, YANG Guo-Qiang
• Review 2021, (9): 1138-1153. DOI:10.19894/j.issn.1000-0518.210221
• Abstract ( 1264 ) PDF (4690KB)( 1704 )

• Towards Extreme Ultraviolet Lithography: Progress and Challenges of Photoresists
• CUI Hao, WANG Qian-Qian, WANG Xiao-Lin, HE Xiang-Ming, XU Hong
• Review 2021, (9): 1154-1167. DOI:10.19894/j.issn.1000-0518.210189
• Abstract ( 1708 ) PDF (2020KB)( 2433 )

• Extreme Ultraviolet Photoresist Inspection Platform in Shanghai Synchrotron Radiation Facility
• ZHAO Jun, YANG Shu-Min, XUE Chao-Fan, WU Yan-Qing, CHEN Yi-Fang, TAI Ren-Zhong
• Review 2021, (9): 1168-1174. DOI:10.19894/j.issn.1000-0518.210190
• Abstract ( 1064 ) PDF (1636KB)( 858 )

• Photolithography of Colloidal Quantum Dots for Display Applications
• ZHANG Ping-Ping, YANG Gao-Ling, KANG Guo-Guo, SHI Jian-Bing, ZHONG Hai-Zheng
• Review 2021, (9): 1175-1188. DOI:10.19894/j.issn.1000-0518.210156
• Abstract ( 1759 ) PDF (3011KB)( 1600 )

Full Papers

Optimization of Development Process for Carbon Dioxide-Based Poly(cyclohexene carbonate) Electron Beam Resist
LU Xin-Yu, MA Bin-Ze, LUO Hao, QI Huan, LI Qiang, WU Guang-Peng
Full Papers 2021, (9): 1189-1198. DOI:10.19894/j.issn.1000-0518.210149
Abstract ( 645 ) PDF (38692KB)( 495 )

Analysis of Defects in Block Copolymer Films by a Convolution Algorithm
TIAN Xin, LAI Han-Wen, LIU Ya-Dong, JI Sheng-Xiang
Full Papers 2021, (9): 1199-1208. DOI:10.19894/j.issn.1000-0518.210121
Abstract ( 516 ) PDF (25952KB)( 309 )