Preface to Special Issue “Photoresist Materials”——Photoresist Materials Facilitate the Production of “China-made Chips”

doi:10.19894/j.issn.1000-0518.210412

Chinese Journal of Applied Chemistry ›› 2021, Vol. 38 ›› Issue (9): 1027-1028.DOI: 10.19894/j.issn.1000-0518.210412

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Preface to Special Issue “Photoresist Materials”——Photoresist Materials Facilitate the Production of “China-made Chips”

JI Sheng-Xiang

Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China

Received:2021-08-17 Accepted:2021-08-17 Published:2021-09-01 Online:2021-09-06

Abstract

CLC Number:

O644

JI Sheng-Xiang. Preface to Special Issue “Photoresist Materials”——Photoresist Materials Facilitate the Production of “China-made Chips”[J]. Chinese Journal of Applied Chemistry, 2021, 38(9): 1027-1028.

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Preface to Special Issue “Photoresist Materials”——Photoresist Materials Facilitate the Production of “China-made Chips”

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