Progress Research on Photosensitive Polyimide

doi:10.19894/j.issn.1000-0518.210274

Chinese Journal of Applied Chemistry ›› 2021, Vol. 38 ›› Issue (9): 1119-1137.DOI: 10.19894/j.issn.1000-0518.210274

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Progress Research on Photosensitive Polyimide

GUO Hai-Quan^*, YANG Zheng-Hua, GAO Lian-Xun

Lab of Polymer Composites Engineering, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China

Received:2021-06-07 Accepted:2021-07-14 Published:2021-09-01 Online:2021-09-06
Supported by:
National Key R&D Program of China (No.2017YFB0404700)

Abstract

Abstract: In recent years, photosensitive polyimide (PSPI) has been rapidly developed under the demand of high-tech fields such as advanced packaging technology, microelectromechanical systems, and organic light-emitting diode (OLED) displays. The progress of PSPI has attracted widespread attention in terms of basic research, application, and industrialization. Photosensitive polyimide shows an increasingly prominent importance as a practical self-patternable film. This paper reviews the recent research progress in the structural design, photochemical reaction and light-sensitive properties of positive and negative photosensitive polyimides, briefly introduces the application in the field of the integrated circuits, microelectromechanical systems and OLED displays, and finally gives an outlook on the development of photosensitive polyimides in research and applications.

Key words: Photosensitive polyimide, Photoresist, redistribution layer, Integrated circuit, Organic light-emitting diode display, Microelectromechanical systems patterning

CLC Number:

O631

GUO Hai-Quan, YANG Zheng-Hua, GAO Lian-Xun. Progress Research on Photosensitive Polyimide[J]. Chinese Journal of Applied Chemistry, 2021, 38(9): 1119-1137.

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Progress Research on Photosensitive Polyimide

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