量子点光刻技术及其显示应用

doi:10.19894/j.issn.1000-0518.210156

摘要/Abstract

摘要： 量子点显示器件具有高光谱纯度、宽色域、高亮度等优势,被认为是显示行业未来的一个重要发展方向。发展量子点高精度光刻图案化技术对实现其在显示领域的应用具有重要的意义。本文阐述了量子点光刻技术的最新进展,主要包括光刻胶辅助剥离光刻和直接光刻技术。在直接光刻技术方面,着重介绍混入光刻胶光刻和配体工程光刻,并对图案化的量子点发光层在光致发光和电致发光中的应用进展进行评述。同时,介绍量子点光刻中存在的问题并展望其在超高分辨率显示领域的应用前景。

关键词: 光刻, 量子点, 图案化, 显示

Abstract: Quantum dot (QD) light-emitting diodes (LEDs) are considered as a promising direction for next-generation display applications because of their excellent spectral purity, wide color gamut, and high brightness. However, developing a technology for high-resolution patterning of QDs remains challenging. This paper expounds the latest progress of QDs photolithography technology, including lift-off photolithography and direct photolithography technology. In the direct photolithography technology, we are focusing on the mixed photoresist and ligand engineering photolithography, we also introduce the progress of patterned QDs luminescence layer in photoluminescence and electroluminescence application. Finally, we provide the problems in QDs photolithography and our outlooks for potential future directions in the field of ultra-high resolution display.

Key words: Photolithography, Quantum dots, Patterning, Display

中图分类号:

O648

张萍萍, 杨高岭, 康果果, 石建兵, 钟海政. 量子点光刻技术及其显示应用[J]. 应用化学, 2021, 38(9): 1175-1188.

ZHANG Ping-Ping, YANG Gao-Ling, KANG Guo-Guo, SHI Jian-Bing, ZHONG Hai-Zheng. Photolithography of Colloidal Quantum Dots for Display Applications[J]. Chinese Journal of Applied Chemistry, 2021, 38(9): 1175-1188.

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