Chinese Journal of Applied Chemistry ›› 1998, Vol. 0 ›› Issue (2): 100-102.

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A Novel Ion type Photosensitive Polyimide

Hou Haoqing, Li Yuesheng, Ding Mengxian   

  1. Polymer Chemistry Laboratory, Chinese Academy of Sciences and China Petro Chemical Corporation, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022
  • Received:1997-07-17 Revised:1997-12-18 Published:1998-04-10 Online:1998-04-10

Abstract: A novel ion type photosensitive polyimide(PSPI) with thiophen acrylic acid as photosensitizer was prepared. It has a sensitivity of 2500 J/m2 and resolution of 1~2 μm under irradiation with Hg lamp of 365 nm wavelength. The catalytic influence of tertiary amine on the imidization of poly(amic acid) during PSPI preparation has been discussed as well.

Key words: photosensitive polyimide, preparation, photolithographic layer