金属辅助化学刻蚀法制备硅纳米线及应用

doi:10.3724/SP.J.1095.2013.30048

摘要/Abstract

摘要： 金属辅助化学刻蚀是近些年发展起来的一种各向异性湿法刻蚀，利用该方法可以制备出高长径比的半导体一维纳米结构。本文综述了金属辅助化学刻蚀法可控制备硅纳米线的最新进展，简要概述了刻蚀的基本过程与机制，重点阐述了基于不同模板的金属辅助化学刻蚀可控制备高度有序、高长径比的硅纳米线阵列的具体流程与工艺，并介绍了其在锂离子电池、太阳能电池、气体传感检测和仿生超疏水等方面的潜在应用，探讨了目前存在的问题及其今后的研究发展方向。

关键词: 硅纳米线, 金属辅助化学刻蚀, 可控制备, 模板, 锂离子电池

Abstract: Metal-assisted chemical etching(MacEtch) is a recently developed anisotropic wet etching method that is capable of producing high aspect ratio semiconductor nanostructures from patterned metal film. The recent progress in the fabrication of silicon nanowires on the basis of MacEtch is reviewed. First, the basic process and mechanism of metal-assisted is briefly introduced. Then template-based metal-assisted chemical etching methods are presented in detail, which can achieve controlled preparation of highly ordered silicon nanowires with high aspect ratio. Next, the introduction to the potential application of silicon nanowires obtained by MacEtch is given, ranging from lithium ion battery, solar cell, to gas detection and biomimetic superhydrophobicity, demonstrating promising potentials of MacEtch. Finally, current problems and future research and development directions of MacEtch are discussed.

Key words: silicon nanowires, metal-assisted chemical etching, controlled fabrication, template, lithium ion battery

中图分类号:

O649

范绪阁, 李国才, 程超群, 胡杰. 金属辅助化学刻蚀法制备硅纳米线及应用[J]. 应用化学, DOI: 10.3724/SP.J.1095.2013.30048.

FAN Xuge, LI Guocai, CHENG Chaoqun, HU Jie*. Progress in Controlled Fabrication Techniques and Applications of Silicon Nanowires Associated with Metal-assisted Chemical Etching[J]. Chinese Journal of Applied Chemistry, DOI: 10.3724/SP.J.1095.2013.30048.

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