Chinese Journal of Applied Chemistry ›› 2024, Vol. 41 ›› Issue (7): 1024-1034.DOI: 10.19894/j.issn.1000-0518.240036
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Xiao-Dong YUAN1,2, Jin-Ping CHEN1,2(), Tian-Jun YU1, Yi ZENG1,2, Yi LI1,2()
Received:
2024-02-01
Accepted:
2024-05-07
Published:
2024-07-01
Online:
2024-08-03
Contact:
Jin-Ping CHEN,Yi LI
About author:
yili@mail.ipc.ac.cnSupported by:
CLC Number:
Xiao-Dong YUAN, Jin-Ping CHEN, Tian-Jun YU, Yi ZENG, Yi LI. A Dual-Tone Chemically Amplified Molecular Photoresist for Multi-Purpose Lithography[J]. Chinese Journal of Applied Chemistry, 2024, 41(7): 1024-1034.
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URL: http://yyhx.ciac.jl.cn/EN/10.19894/j.issn.1000-0518.240036
Fig.2 Absorption spectra of PAGAN with different concentrations in acetonitrile, the inset shows the fitted curve of absorbance at 365 nm of PAGAN as a function of concentration
Fig.3 Absorption spectra of rhodamine B in acetonitrile with different concentrations of trifluoromethanesulfonic acid; the inset shows the fitted curve of the absorbance at 555 nm of rhodamine B as a function of acid concentration
5.0% PAGAN | 7.5% PAGAN | 10.0% PAGAN | |
---|---|---|---|
D0/(mJ·cm-2) | 13.0 | 11.5 | 10.2 |
D100/(mJ·cm-2) | 34.1 | 28.6 | 23.9 |
γ | 2.38 | 2.52 | 2.70 |
Table 1 Contrasts and sensitivities of SP8-PAGAN photoresists (5.0%, 7.5%, 10.0% PAGAN) at 365 nm lithography
5.0% PAGAN | 7.5% PAGAN | 10.0% PAGAN | |
---|---|---|---|
D0/(mJ·cm-2) | 13.0 | 11.5 | 10.2 |
D100/(mJ·cm-2) | 34.1 | 28.6 | 23.9 |
γ | 2.38 | 2.52 | 2.70 |
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