化学亚胺化程度对正性光敏聚酰亚胺影响

doi:10.11944/j.issn.1000-0518.2017.03.160195

摘要/Abstract

摘要：

选用2,2'-双三氟甲基-4,4'-联苯二胺(TFDB)与二苯醚四甲酸二酐(ODPA)作为聚合物的基本骨架进行缩聚反应生成聚酰胺酸,再经过化学亚胺化得到可溶性聚酰亚胺(PI)。通过调节2-甲基吡啶在亚胺化试剂中的含量以达到控制酰亚胺化程度的目的,探讨不同亚胺化程度的PI胶的显影性能。结果表明,当n(2-甲基吡啶):n(乙酸酐)=1:5时,所合成的光敏聚酰亚胺的显影性能最优。

关键词: 正性光敏聚酰亚胺, 化学亚胺化, 溶解性, 光刻

Abstract:

Condensation polymerization of 2,2'-bis(trifluoromethyl)-4,4'-diamino biphenyl(TFDB) and 3,3',4,4'-tetracarboxydiphthalic ether dianhydride(ODPA) gives a soluble polyimide. The effect of the degree of chemical imidization on positive photosensitive polyimide performance was investigated by adjusting the content of α-picoline in the imidization reagent to control the extent of the imide. The results show that the photosensitive polyimide has the best developing performance when the mole ratio of α-picoline to acetic anhydride is 1 to 5 in the process of chemical imidization.

Key words: positive photosensitive polyimide, chemical imidization, solubility, photolithography

朱丹阳, 金锐, 吴作林, 韩宝春, 杨正华, 张春华. 化学亚胺化程度对正性光敏聚酰亚胺影响[J]. 应用化学, 2017, 34(3): 276-281.

ZHU Danyang, JIN Rui, WU Zuolin, HAN Baochun, YANG Zhenghua, ZHANG Chunhua. Effect of the Degree of Chemical Imidization on the Positive Photosensitive Polyimide[J]. Chinese Journal of Applied Chemistry, 2017, 34(3): 276-281.

参考文献

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