Chinese Journal of Applied Chemistry ›› 1996, Vol. 0 ›› Issue (2): 115-116.

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Effect of the Lewis Acid Strength of Doping Elements on Electronic Properties of Doped In2O3

Wen Shijie1, G. Campet2, Hong Guangyan3   

  1. 1. Lawrence Berkeley Laboratory, Berkeley CA94720, USA;
    2. Laboratoire de Chimie du Solide du CNRS, Universite de Bordeaux I, 33405 Talence Cedex, France;
    3. Changchun Institute of Applied Cherrzistry, Chinese Academy of Sciences, Changchun 130022
  • Received:1995-08-18 Revised:1995-11-27 Published:1996-04-10 Online:1996-04-10

Abstract: This paper discussed the relation between the electronic properties of doped In2O3 and the Lewis acid strength of doping elements. The authors pointed out the key to the choice of appropriate doping elements for improving electric properties of doped In2O3. The carrier concentration and mobility of doped In2O3 increased when Ti4+,Ge4+ and Sn4+ were used as doping elements.

Key words: Lewis acid, In2O3, doping