Research Progress on Chemically Amplified 193 nm Photoresists

doi:10.19894/j.issn.1000-0518.210264

Chinese Journal of Applied Chemistry ›› 2021, Vol. 38 ›› Issue (9): 1105-1118.DOI: 10.19894/j.issn.1000-0518.210264

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Research Progress on Chemically Amplified 193 nm Photoresists

LI Xiao-Ou¹, GU Xue-Song¹, LIU Ya-Dong^1,2*, JI Sheng-Xiang^1,2*

¹Huangpu Institute of Advanced Materials,Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Guangzhou 510530, China
²Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China

Received:2021-06-01 Accepted:2021-07-06 Published:2021-09-01 Online:2021-09-06
Supported by:
National Natural Science Foundation of China (No.51973212) and the Department of Science and Technology of Jilin Province (No.20200301017RQ)

Abstract

Abstract: There are several platforms for 193 nm photoresists, including chemically/non-chemically amplified photoresists, molecular glass and inorganic-organic hybrid systems. This review mainly focueses on chemically amplified photoresists due to their predominante role in industrial applications. The main components of the 193 nm chemically amplified photoresist include polymer resins, photoacid generators, additives (alkaline additives, dissolution inhibitors, etc.) and solvents. We review the current status of representative 193 nm photoresists and their main components and their advantages, disadvantages and possible development directions are also discussed.

Key words: Chemically amplified photoresist, Polymer resin, Photoacid generator, Alkaline additive, Dissolution inhibitor

CLC Number:

O644

LI Xiao-Ou, GU Xue-Song, LIU Ya-Dong, JI Sheng-Xiang. Research Progress on Chemically Amplified 193 nm Photoresists[J]. Chinese Journal of Applied Chemistry, 2021, 38(9): 1105-1118.

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Research Progress on Chemically Amplified 193 nm Photoresists

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