Chinese Journal of Applied Chemistry ›› 2016, Vol. 33 ›› Issue (9): 1093-1098.DOI: 10.11944/j.issn.1000-0518.2016.09.150408

• Full Papers • Previous Articles    

Electrochemical Behavior of Tantalum Pentachloride in 1-Butyl-3-methylimidazolium Hexafluorophosphate Ionic Liquid

XIE Fangxia(),HE Xueming,LYU Yanming,YU Jinghu,WU Meiping   

  1. Jiangsu Key Laboratory of Advanced Food Manufacturing Equipment and Technology, School of Mechanical Engineering,Jiangnan University,Wuxi,Jiangsu 214122,China
  • Received:2015-11-23 Accepted:2016-02-18 Published:2016-08-23 Online:2016-08-23
  • Contact: XIE Fangxia
  • Supported by:
    Supported by the National Natural Science Foundation of China(No.51501073, No.51375209), Jiangsu Provincial Natural Science Foundation of China(No.BK20140162), the Fundamental Research Funds for the Central Universities(No.JUSRP11455, No.JUSRP51511)

Abstract:

The electrochemical behavior of 0.25 mol/L tantalum pentachloride is investigated in 1-butyl-3-methylimidazolium hexafluorophosphate([Bmim]PF6) by cyclic voltammetry. The results show that the electrodeposition process of tantalum is a two-step irreversible electrode reaction by diffusion control. Tantalum(Ⅴ) is first reduced to tantalum(Ⅲ), and tantalum(Ⅲ) is further reduced to tantalum metal and tantalum subchloride. The cathodic transfer coefficients of Ta(Ⅴ)/Ta(Ⅲ) and Ta(Ⅲ)/Ta are 0.155 and 0.406, respectively. The diffusion coefficient of Ta(Ⅴ) is 1.629×10-9 cm2/s. The electrodeposition of tantalum on platinum substrate from TaCl5-[Bmim]PF6 is performed using the potentiostatic method at 100 ℃ and -1.25 V.SEM and EDS analysis results indicate that the electrodeposits are mixtures of tantalum metal and tantalum subchiloride.

Key words: tantalum pentachloride, ionic liquid, electrochemistry, electrodeposition