应用化学 ›› 1998, Vol. 0 ›› Issue (2): 100-102.

• 研究论文 • 上一篇    下一篇

新的离子型光敏聚酰亚胺

侯豪情, 李悦生, 丁孟贤   

  1. 中国科学院长春应用化学研究所中国科学院-中国石化总公司高分子化学联合开放实验室 长春130022
  • 收稿日期:1997-07-17 修回日期:1997-12-18 出版日期:1998-04-10 发布日期:1998-04-10
  • 基金资助:
    吉林省重点科技发展项目

A Novel Ion type Photosensitive Polyimide

Hou Haoqing, Li Yuesheng, Ding Mengxian   

  1. Polymer Chemistry Laboratory, Chinese Academy of Sciences and China Petro Chemical Corporation, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022
  • Received:1997-07-17 Revised:1997-12-18 Published:1998-04-10 Online:1998-04-10

摘要: 离子型光敏聚酰亚胺(PSPI)是一种重要的耐热光敏材料[1],其光敏基团是通过叔胺基与 羧基相互作用而与聚酰胺酸分子主链相联接的.但叔胺对聚酰胺酸(PAA)的酰亚胺化反应有 促进作用[2,3],使离子型PSPI光刻胶在前烘工序阶段有部分酰亚胺化作用发生,降低了胶膜 的溶解性能,造成显影困难,甚至产生部分不溶物,形成光刻不净的“底膜”.最近,我们设计合成了一种新的离子型PSPI光刻胶,研究了其感光特性和叔胺基的酰亚胺化催化作用对其光刻性能的影响.

关键词: 光敏聚酰亚胺, 制备, 光刻胶

Abstract: A novel ion type photosensitive polyimide(PSPI) with thiophen acrylic acid as photosensitizer was prepared. It has a sensitivity of 2500 J/m2 and resolution of 1~2 μm under irradiation with Hg lamp of 365 nm wavelength. The catalytic influence of tertiary amine on the imidization of poly(amic acid) during PSPI preparation has been discussed as well.

Key words: photosensitive polyimide, preparation, photolithographic layer