应用化学 ›› 1996, Vol. 0 ›› Issue (6): 78-80.

• 研究简报 • 上一篇    下一篇

L-缬氨酸修饰石墨电极不对称还原苯甲酰甲酸

陈刚, 陆嘉星, 徐承天, 高剑南, 陈良, 张五昌   

  1. 华东师范大学化学系 上海 200062
  • 收稿日期:1996-02-16 修回日期:1996-08-12 出版日期:1996-12-10 发布日期:1996-12-10
  • 基金资助:
    国家自然科学基金

Asymmetric Reduction of Phenylglyoxylic Acid Using Poly-L-Valine Modified Graphite Electrode

Chen Gang, Lu Jiaxing, Xu Chengtian, Gao Jiannang, Chen Liang, Zhang Wuchang   

  1. Department of Chemistry, East China Normal University, Shanghai 200062
  • Received:1996-02-16 Revised:1996-08-12 Published:1996-12-10 Online:1996-12-10

摘要: 近年来,用化学修饰电极进行不对称合成日益受到人们重视.Nonaka等用聚L-撷氨酸(PLV)修饰石墨电极(Ce/PLV)和修饰铂电极(Pte/PLV)分别还原4-甲基香豆素和氧化苯基叔丁基醚,产物光学收率(o.y.)分别为43%和93%,而用Ce/PLV还原拨基化合物的研究尚不多见.

关键词: L-缬氨酸, 修饰电极, 不对称还原, 苯甲酰甲酸

Abstract: Poly-L-valine was modified on graphite to produce polymer modified graphite electrode(Ce/PLV) on which phenylglyoxylic acid(PGA) was reduced to S(+)-mandelic acid(SMA).By using Ce/PLV,the optical yield(o.y.) of SMA and conversion percent of PGA were measured as functions of various factors.The highest o.y. obtained under optimized conditions was 63.8%.A possible stereochemical model of asymmetric reduction of PGA was proposed.

Key words: poly-L-valine, modified electrode, asymmetric reduction, phenylglyoxylic acid