氯化钽在离子液体1-丁基-3-甲基咪唑六氟磷酸盐中电化学行为

doi:10.11944/j.issn.1000-0518.2016.09.150408

摘要/Abstract

摘要：

采用循环伏安法,研究了0.25 mol/L TaCl₅在离子液体1-丁基-3-甲基咪唑六氟磷酸盐([Bmim]PF₆)中的电化学行为。实验结果表明,电沉积钽是受扩散控制、两步骤的不可逆电极反应过程,首先是Ta(Ⅴ)还原为Ta(Ⅲ),其次是Ta(Ⅲ)还原为金属钽和形成其它低价钽氯化物。 Ta(Ⅴ)/Ta(Ⅲ)和Ta(Ⅲ)/Ta在离子液体[Bmim]PF₆中的阴极传递系数分别为0.155和0.406。 Ta(Ⅴ)在离子液体[Bmim]PF₆中的扩散系数为1.629×10^-9 cm²/s。在100 ℃和-1.25 V条件下,采用恒电势法在铂片上电沉积钽,扫描电子显微镜照片和EDS分析表明,沉积物为钽和钽的低价氯化物。

关键词: 氯化钽, 离子液体, 电化学, 电沉积

Abstract:

The electrochemical behavior of 0.25 mol/L tantalum pentachloride is investigated in 1-butyl-3-methylimidazolium hexafluorophosphate([Bmim]PF₆) by cyclic voltammetry. The results show that the electrodeposition process of tantalum is a two-step irreversible electrode reaction by diffusion control. Tantalum(Ⅴ) is first reduced to tantalum(Ⅲ), and tantalum(Ⅲ) is further reduced to tantalum metal and tantalum subchloride. The cathodic transfer coefficients of Ta(Ⅴ)/Ta(Ⅲ) and Ta(Ⅲ)/Ta are 0.155 and 0.406, respectively. The diffusion coefficient of Ta(Ⅴ) is 1.629×10^-9 cm²/s. The electrodeposition of tantalum on platinum substrate from TaCl₅-[Bmim]PF₆ is performed using the potentiostatic method at 100 ℃ and -1.25 V.SEM and EDS analysis results indicate that the electrodeposits are mixtures of tantalum metal and tantalum subchiloride.

Key words: tantalum pentachloride, ionic liquid, electrochemistry, electrodeposition

颉芳霞, 何雪明, 吕彦明, 俞经虎, 武美萍. 氯化钽在离子液体1-丁基-3-甲基咪唑六氟磷酸盐中电化学行为[J]. 应用化学, 2016, 33(9): 1093-1098.

XIE Fangxia, HE Xueming, LYU Yanming, YU Jinghu, WU Meiping. Electrochemical Behavior of Tantalum Pentachloride in 1-Butyl-3-methylimidazolium Hexafluorophosphate Ionic Liquid[J]. Chinese Journal of Applied Chemistry, 2016, 33(9): 1093-1098.

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