应用化学 ›› 1986, Vol. 0 ›› Issue (3): 40-44.

• 研究论文 • 上一篇    下一篇

铝箔在盐酸中的交流电侵蚀的研究—Ⅰ.50周交流电侵蚀

沈行素1, 林海潮1, 阎康平2   

  1. 1. 中国科学院长春应用化学研究所;
    2. 成都科技大学化工系
  • 收稿日期:1985-08-01 修回日期:1985-11-28 出版日期:1986-06-10 发布日期:1986-06-10
  • 通讯作者: 沈行素

ON AC ETCHING OF ALUMINUM FOIL IN HYDROCHLORIC ACID Ⅰ.WITH 50 Hz.AC

Shen Xingsu1, Lin Haichao1, Yan Kangpin2   

  1. 1. Changchun Institute of Applied Chemistry, Academia Sinica;
    2. Department of Chemical Engineering, Chengdu University of Science and Techniogy
  • Received:1985-08-01 Revised:1985-11-28 Published:1986-06-10 Online:1986-06-10

摘要: 研究了电解电容器用铝箔在5M HCl中用50周交流电侵蚀时温度、电流密度、铝箔纯度以及H2SO4添加剂等因素对表面积扩大率K值的影响。得到高K值的关键是得到高质量的侵蚀膜,SO42-是成膜所必需的。用剥膜称重法得到了不同条件下单位真实表面积上的膜重,结合电位波形图解释了一系列现象。侵蚀过程中出现的表面大量掉落黑粉,箔厚减薄、比容不再随电量而增加的现象与侵蚀孔中pH过高、侵蚀膜(氧化铝)水化程度高、体积大因而堵塞小孔有关。保证有足够的H+扩散进入孔中是得到高K值的又一关键。

Abstract: The influence of temperature, current density, foil purity and the additive on A.C.etching of aluminum electrolytic capacitor foil in hydrochloric acid were studied. It was shown that in order to obtain a high developed surface, it is necessary to have a high quality etch film, in its formation SO42- ion plays an important role. The results were interpreted in terms of the potential response patterns and the film weight on per unit area of real surface, calculated from the weight loss before and after stripping off the film and the coefficient of surface area gain K. The formation of the black powders and smutt-ing of the surface after etching with a certain quantity of electricity may be attributed to the higher pH value developed during the cathodic period, causing the precipitation of volu-minous hydrated aluminum oxide and blocking of the etch pits. Sufficient supply of H+ ion is another important condition for high developed surface of foil.