新型硫鎓盐产酸剂的合成及其产酸效率研究

摘要/Abstract

摘要：

本文合成了六种适用于248nm光致抗蚀剂的产酸剂，其中吩噻口恶体系的产酸剂由本研究室自主设计合成。六种产酸剂均通过IR,HNMR,UV等进行了结构表征，并利用酸敏染料遇酸异构变色的特点定量检测了六种产酸剂的产酸效率，同时使用荧光追踪法研究了溶剂极性对产酸效率的影响，优选出了硫杂蒽酮系列的产酸剂，为进一步用于248nm光致抗蚀剂提供参考。

关键词: 硫鎓盐, 产酸剂, 产酸效率

Abstract:

Six sulfonium PAGs which are used in 248nm photoresists were synthesized in this article, some of them which used phenothioxin as reactant was firstly innovated by our lab. All of the PAGs was identified by IR, HNMR and UV, besides that, we used rhodamine B to evaluate the acid-generation efficiency. We also studied how the solvent effect the acid-generation by fluorescence. The PAGs which were synthesized by thioxanthen-9-one and isopropylthioxanthen-9-one were choosed as the best ones. All the study will be valuable if we apply these novel sulfonium PAGs to 248nm photoresist.

Key words: sulfonium salts, photoacid generator, acid-generation efficiency

中图分类号:

314.269

杨幸幸, 邹应全. 新型硫鎓盐产酸剂的合成及其产酸效率研究[J]. 应用化学, 2009, 26(10): 1194-1199.

YANG Xing-Xing, JU Ying-Quan. Synthesis and Study on the Acid-generation[J]. Chinese Journal of Applied Chemistry, 2009, 26(10): 1194-1199.

新型硫鎓盐产酸剂的合成及其产酸效率研究

Synthesis and Study on the Acid-generation

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