应用化学 ›› 1990, Vol. 0 ›› Issue (6): 82-84.

• 研究简报 • 上一篇    下一篇

辉光放电处理聚四氟乙烯——Ⅲ.PTFE表面结构的XPS表征

周茂堂, 王世才, 陈捷   

  1. 中国科学院长春应用化学研究所 长春 130022
  • 收稿日期:1989-12-21 修回日期:1990-05-07 出版日期:1990-12-10 发布日期:1990-12-10

PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE

Zhou Maotang, Wang Shicai, Chen Jie   

  1. Changchun Institute of Applied Chemistry, Academia Sinica, Changchun 130022
  • Received:1989-12-21 Revised:1990-05-07 Published:1990-12-10 Online:1990-12-10

摘要: Yasuda等[1]在用XPS研究离子体处理后的PTFE表面结构时,得到一个包络的C1s峰。本文对此进行探讨。

关键词: 聚四氟乙烯, 等离子体处理, XPS, 表面结构

Abstract: The surface modification of polytetrafluoroethylene film by exposuring to argon plasma was carried out and the structure of the surface was investigated by x-ray photoelectron spectroscopy(XPS). The broad, overlaping C1s peak in XPS spectrum was considered to be formed from 284.6(CH), 286.6(CO), 287.9(C = O), 289.0(CF)and 292.3 eV(CF2). It is found that, along with oxygen, nitrogen was also introduced into the surface structure of PTFE upon plasma treatment.

Key words: polytetrafluooethylene, plasma treatment, XPS, surface structure