Chinese Journal of Applied Chemistry
Towards Extreme Ultraviolet Lithography: Progress and Challenges of Photoresists
CUI Hao, WANG Qian-Qian, WANG Xiao-Lin, HE Xiang-Ming, XU Hong
Chinese Journal of Applied Chemistry . 2021, (9): 1154 -1167 .  DOI: 10.19894/j.issn.1000-0518.210189

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