PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE

Chinese Journal of Applied Chemistry ›› 1990, Vol. 0 ›› Issue (6): 82-84.

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PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE

Zhou Maotang, Wang Shicai, Chen Jie

Changchun Institute of Applied Chemistry, Academia Sinica, Changchun 130022

Received:1989-12-21 Revised:1990-05-07 Published:1990-12-10 Online:1990-12-10

Abstract

Abstract: The surface modification of polytetrafluoroethylene film by exposuring to argon plasma was carried out and the structure of the surface was investigated by x-ray photoelectron spectroscopy(XPS). The broad, overlaping C₁s peak in XPS spectrum was considered to be formed from 284.6(CH), 286.6(CO), 287.9(C = O), 289.0(CF)and 292.3 eV(CF₂). It is found that, along with oxygen, nitrogen was also introduced into the surface structure of PTFE upon plasma treatment.

Key words: polytetrafluooethylene, plasma treatment, XPS, surface structure

Zhou Maotang, Wang Shicai, Chen Jie. PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE[J]. Chinese Journal of Applied Chemistry, 1990, 0(6): 82-84.

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PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE

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