Chinese Journal of Applied Chemistry ›› 1996, Vol. 0 ›› Issue (2): 18-21.

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Laser-Induced Selective Deposition of Copper on p-Silicon Wafers

Jiang Guifeng, Yu Zuzhan   

  1. Department of Chemistry, Fudan University, Shanghai 200433
  • Received:1995-06-28 Revised:1995-10-30 Published:1996-04-10 Online:1996-04-10

Abstract: A process is described to selectively deposit thin copper films from electroless copper plating solutions on p-silicon wafers. The p-silicon was locally irradiated using a 5 WCW Ar+ laser. At the irradiated area,the copper film was formed.In this process.three kinds of thin copper films were obtained from the solutions containing different reductants. Composition and properties of the deposits were investigated using AES, SEM and RBS techniques.

Key words: electroless plating, laser-induced deposition