The Effect of Accelerator on the Composition and Structure of Chemically Plated Nickel Deposit

Chinese Journal of Applied Chemistry ›› 1995, Vol. 0 ›› Issue (6): 50-52.

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The Effect of Accelerator on the Composition and Structure of Chemically Plated Nickel Deposit

Fang Jingli, Wu Yong, Han Keping, Zhang Min

Institute of Applied Chemistry, State Key Laboratory of Coordination Chemistry, Nanjing University, Nanjing 210093

Received:1994-12-11 Revised:1995-05-22 Published:1995-12-10 Online:1995-12-10

Abstract

Abstract: The effect of organic sulfur accelerator on the deposition rate of chemical nickel-plating and on the oxidation rate of sodium hypophosphite was studied.It is found that theacceleration mechanism is due to the catalytic action of accelerator for the oxidation of hy-pophosphite, The results of XPS Indicate that the coating is composed of Ni and Ni₂P alloy.The composition (relative atomic concentration %)of the Ni-P coating are Ni 74.3%,P 18.3%,O 5.8% and S 1.6% as obtained from the AES depth profile ctirves.

Key words: chemical nickel-plating, Ni-P alloy, accelerator, thiourea

Fang Jingli, Wu Yong, Han Keping, Zhang Min. The Effect of Accelerator on the Composition and Structure of Chemically Plated Nickel Deposit[J]. Chinese Journal of Applied Chemistry, 1995, 0(6): 50-52.

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The Effect of Accelerator on the Composition and Structure of Chemically Plated Nickel Deposit

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