Chinese Journal of Applied Chemistry ›› 1992, Vol. 0 ›› Issue (5): 101-103.
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Han Wenjun1, Mai Guangxin1, Li Bin1, Wei Peihai1, Chen Youpeng2, Li Shuying2
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Abstract: The technological process of textured FTO(SnO2doped with F) film by CVD technique is reported. The optimum conditions for the preparation of textured FTO films of 30×30cm2 with Rsq～10Ω/sq,T～85%, film unevenness<±5% are: Tg=450～50℃, flow rate of ethylene fluoride:0.15～0.30L/min.
Key words: doped tin oxide, semiconductive film, ethylene fluoride chemical vapour deposition
Han Wenjun, Mai Guangxin, Li Bin, Wei Peihai, Chen Youpeng, Li Shuying. PREPARATION OF TRANSPARENT ELECTRICALLY CONDUCTIVE TEXTURED SnO2 DOPED WITH F FILM(FTO)[J]. Chinese Journal of Applied Chemistry, 1992, 0(5): 101-103.
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