Chinese Journal of Applied Chemistry ›› 1986, Vol. 0 ›› Issue (2): 48-52.

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THE EFFECT OF CHROMIUM DEPOSITION RATE ON THE BEHAVIOUR OF Cr-MIS SOLAR CELL

Li Wenfan, Liu Xiuying   

  1. Changchun Institute of Applied Chemistry, Academia Sinica
  • Received:1985-02-02 Revised:1985-06-12 Published:1986-04-10 Online:1986-04-10

Abstract: It was shown in this paper that the work function of the rapidly deposited Cr layer was smaller than that of slowly deposited one with the average value of 3.99eV and an increased value of Voc up to 0.51—0.56V.The sheet resistance of Cr can then be decreased.Therefore,the Cu layer as well as the outer layer of Cr usually deposited for decreasing the sheet resistance of Cr and for preventing Cu from oxidation,respectively, can be sa-ved.The conversion effecioncy of Cr-MIS solar cell is of 12%,based on the active area of 1.3cm2 at AM1.5 (100mW/cm2).