中华医学超声杂志

应用化学 ›› 1992, Vol. 0 ›› Issue (5): 34-38.

• 研究论文 • 上一篇    下一篇

低磷化学镀镍层的组成和结构

方景礼, 叶向荣, 方晶   

  1. 南京大学应用化学研完所, 南京 210008
  • 收稿日期:1991-06-25 修回日期:1992-04-15 出版日期:1992-10-10 发布日期:1992-10-10

COMPOSITION AND STRUCTURE OF THE LOW PHOSPHOROUS ELECTROLESS NICKEL COATING

Fang Jingli, Ye Xiangrong, Fang Jing   

  1. Institute of Applied Chemistry, Nanjing University, Nanjing 210008
  • Received:1991-06-25 Revised:1992-04-15 Published:1992-10-10 Online:1992-10-10

PDF

504

被引次数

40 | 6

摘要： 用SEM、XPS、AES和X-射线衍射法研究了低磷化学镀镍层的形貌、结晶状态、组成元素及其价态和深度分布。结果表明,低磷化学镀镍磷合金层为层状结构,镀态的镀层由低晶态的Ni和Ni2P组成,350℃热处理1小时后转化为完全晶态的Ni和Ni3P。镍和磷均为零价态,它们的结合能分别为129.lev和852.3eV。镀层的真实组成(相对原子百分浓度)为:Ni 85.4%,P 10.1%,O 4.5%。

关键词: 化学镀镍, Ni-P合金, X-射线衍射, X-射线光电子能谱, 俄歇电子能谱

Abstract: The morphology, crystalline state, composition elements and their depth, profile and valence state were studied by scannfing electron microscopy (SEMi), x-ray diffractometry (XRD) and electron spectrometry (XPS and AES). The result showed that the low phosphorous electroless nickel coating has a smooth lamellar structure, composed of Ni and Ni2P of low crystalline state, but they were transformed into Ni and Ni3P of complete crystalline state after heat treatment at 350℃ for 1h.The phosphorous and nickel in low phosphorous eleetroless nickel coating were in zero valance state, with binding energy being 129.1 eV and 852.3 eV respectively. The compositions(A.C.%) of the Ni-P coating were Ni 85.4%, P 10.1%, O 4.5% as obtained after the constant composition region of the AES depth profile curves of the Ni-P coating.

Key words: electroless nickel plating, Ni-P alloy, XPS, AES, XRD

网站版权 © 应用化学     本网站备案：吉ICP备12000082号