应用化学 ›› 1988, Vol. 0 ›› Issue (6): 44-48.

• 研究论文 • 上一篇    下一篇

柠檬酸盐-氨体系化学镀Ni-B合金的研究

方景礼   

  1. 南京大学应用化学研究所
  • 收稿日期:1987-10-12 修回日期:1988-01-03 出版日期:1988-12-10 发布日期:1988-12-10

STUDY ON ELECTROLESS Ni-B ALLOY PLATING FROM CITRATE-AMMONIA SYSTEM

Fang Jingli   

  1. Applied Chemistry Institute, Nanjing University
  • Received:1987-10-12 Revised:1988-01-03 Published:1988-12-10 Online:1988-12-10

摘要: 本文研究了柠檬酸盐-氨体系化学镀Ni-B合金的镀液成份和沉积条件对沉积速度和镀层含硼量的影响,确定了镀液的最佳组成和条件为:NiSO4·7H2O 40g/l,H3BO3 30g/l,NH4C130g/l,柠檬酸三铵20g/l,二甲氨基硼烷4g/l,pH9.5~10.0,45℃.测定了镀层的性能。该镀层的接触电阻约为0.126Ω,与银的相近。XPS和AES的研究结果表明,Ni-B镀层由Ni2B合金和Ni组成,但其表面有部分Ni(Ⅱ)和B(Ⅲ)存在。

关键词: 镍硼合金, 化学镀, 柠檬酸盐-氨体系, 二甲氨基硼烷

Abstract: The effects of bath composition and deposition conditions on the deposition rate and boron content of the deposit from the bath of citrate-ammonia system have been investigated, The optimum bath composition and deposition conditions are as follows: NiSO4·7H2O 40g/l, HB3O3 30g/l, NH4Cl 30g/l, triammonium citrate 20g/l, dimothylaminoborane (DMAB)4g/l, pH9.5—10, 45℃. The deposit has contact resistance atout 0.126Ω, very close to that of Ag deposit.The XPS and AES results showed that the Ni-B deoosit is composed of Ni2B alloy and Ni. Ni(Ⅱ) and B(Ⅲ) were found on the surface of the deposit.

Key words: Nickel-boron alloy, Electroless plating, Citrate-ammonia system, Dimethylaminoborane