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Chinese
A Dual-Tone Chemically Amplified Molecular Photoresist for Multi-Purpose Lithography
Xiao-Dong YUAN, Jin-Ping CHEN, Tian-Jun YU, Yi ZENG, Yi LI
Chinese Journal of Applied Chemistry . 2024, (
7
): 1024 -1034 . DOI: 10.19894/j.issn.1000-0518.240036
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