Chinese Journal of Applied Chemistry
Photoresist Film-Forming Agent: Development and Future
PENG Xiao-Kang, HUANG Xing-Wen, LIU Rong-Tao, ZHANG Yong-Wen, ZHANG Shi-Yang, LIU Yi-Dong, MIN Yong-Gang
Chinese Journal of Applied Chemistry . 2021, (9): 1079 -1090 .  DOI: 10.19894/j.issn.1000-0518.210152

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