Chinese Journal of Applied Chemistry ›› 2008, Vol. 25 ›› Issue (6): 633-636.

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碲欠电位沉积于金衬底上碲离子浓度和扫描速率对欠电位的影响

朱文;杨君友;周东祥;肖承京;段兴凯   

  1. 华中科技大学
  • Received:2009-06-29 Revised:2009-06-29 Published:2008-06-10 Online:2008-06-10
  • Contact: 朱文;杨君友;周东祥;肖承京;段兴凯

Abstract: 电化学原子层外延;欠电位沉积;碲;热电材料

CLC Number: