Chinese Journal of Applied Chemistry ›› 1998, Vol. 0 ›› Issue (2): 56-59.

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The Effects of As, Sb and Bi on the Cathodic Copper Deposition

Lu Daorong, Li Xueliang, Lin Jianxin   

  1. College of Chemical Engineering, Hefei University of Technology, Hefei 230009
  • Received:1997-08-12 Revised:1997-11-28 Published:1998-04-10 Online:1998-04-10

Abstract: The effects of As(Ⅴ), Sb(Ⅲ) and Bi(Ⅲ) on the kinetics of the cathodic copper deposition reaction in acidified CuSO4 have been investigated by linear potential sweep method, XPS and XRD. The results indicated that As(Ⅴ) ions increased the density of exchange current of copper deposition reaction and had done an action of unpolarization on the process of copper deposition. Sb(Ⅲ) and Bi(Ⅲ) ions, on the contrary, decreased the density of exchange current and had an action of polarization on the process of copper deposition. As, Sb and Bi ions showed no influence on the reaction mechanism of copper deposition. They did not deposite on the cathode when electrolysis was at 200 A/m2, they also did not effect on the copper deposition predominant crystal orientation(220). As and Bi co-deposited on the cathode with Cu when electrolysis was at 1500 A/m2, with copper deposition predominant crystal orientation being changed into (111). Copper deposited in the form of metal Cu and few in Cu2O. Bismuth was in the form of Bi2O3.

Key words: arsenic, antimony, bismuth, electrorefining copper, exchange current density, polarization, predominant crystal orientation