具有双重显影特性的多用途单分子树脂化学放大光刻胶
苑晓冬, 陈金平, 于天君, 曾毅, 李嫕
A Dual-Tone Chemically Amplified Molecular Photoresist for Multi-Purpose Lithography
Xiao-Dong YUAN, Jin-Ping CHEN, Tian-Jun YU, Yi ZENG, Yi LI
应用化学
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2024, (7): 1024
-1034
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DOI: 10.19894/j.issn.1000-0518.240036
