光刻胶成膜剂:发展与未来
朋小康, 黄兴文, 刘荣涛, 张永文, 张诗洋, 刘屹东, 闵永刚
Photoresist Film-Forming Agent: Development and Future
PENG Xiao-Kang, HUANG Xing-Wen, LIU Rong-Tao, ZHANG Yong-Wen, ZHANG Shi-Yang, LIU Yi-Dong, MIN Yong-Gang
应用化学
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2021, (9): 1079
-1090
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DOI: 10.19894/j.issn.1000-0518.210152
