应用化学 ›› 1986, Vol. 0 ›› Issue (5): 44-48.

• 研究论文 • 上一篇    下一篇

铝箔在盐酸中的交流电侵蚀的研究—Ⅱ.50周交流电正半周侵蚀

沈行素, 杨树魁   

  1. 中国科学院长春应用化学研究所
  • 收稿日期:1985-08-01 修回日期:1985-12-01 出版日期:1986-10-10 发布日期:1986-10-10
  • 通讯作者: 沈行素

ON A. C. ETCHING OF ALUMINUM FOIL IN HYDROCHLORIC ACID Ⅱ.WITH POSITIVE HALF CYCLE RECTIFIED CURRENT

Shen Xingsu, Yang Shukui   

  1. Changchun Institute of Applied Chemistry, Academia Sinica
  • Received:1985-08-01 Revised:1985-12-01 Published:1986-10-10 Online:1986-10-10

摘要: 五种不同纯度电容器用铝箔(99.97—99.999%Al)在盐酸中用50周交流电正半周进行侵蚀。由于侵蚀膜是在断电半周低pH值下形成的,属透明钝化型薄膜,不堵塞侵蚀孔,因此不出现纯交流电侵蚀时的"掉粉"、"减薄"现象。实验结果表明,侵蚀形态以及表面积扩大率与箔的纯度,也即其自钝化能力有关。用电位波形图解释了得到的现象。

Abstract: Five different capacitor grade aluminum foils ranging in purity from 99.97 to 99.999 per cent Al were electrolytically etched in hydrochloric acid under 50Hz A.C. with po-sitive half cycle rectified. The impurities in aluminum were found to influence markedly on the results. The etch morphology of extra pure foil exhibits a deep layer of regularly distributed cubic pits, giving a higher surface area gain.When the impurities in alumin-um increased, the etch pits grew larger and the new pits developed only along the (100) direction at the later stage of etching, forming tappered cubic tunnels and having a lower surface area gain. The results were interpreted by the potential oscillographs and were considered to be related to the ability of passivation of aluminum foil with diffe-rent purity. Because the acidity inner the pits was higher than that in the bulk solu-tion, the etch film formed was thin and transparent, quite differing from the thick pre-cipitated one as in the case of full A.C. etching, which gives a higher pH value owing to the hydrogen evolution during the negative half cycle. Some additives and their effects were also investigated.