异氰酸酯（—NCO）基化合物

Isocyanate （—NCO）-based compounds

—NCO中的N原子与H原子结合形成络合物，不仅清除了副产物HF和PF₅，还参与生成优良的界面膜

The N atoms in —NCO combine with H atoms to form complexes， which not only remove the by-products HF and PF₅， but also participate in the formation of the excellent interfacial film

该化合物作为添加剂在电解液中除杂的研究较少，机理仍需进一步探究

There's not a lot of research on using these compounds as additives to remove impurities in the electrolyte， and the mechanism still needs to be further explored

硅烷类（Si—O）化合物

Silane （Si—O） compounds

Si—O烷基属于碱类化合物，可与H⁺结合，除去电解液中酸性杂质，并且Si对F较高的亲和力可清除分离出的F^-，同时参与SEI膜的构建

Si—O alkyl can be combined with H⁺ to remove acidic impurities in electrolyte， due to its basic functional groups， and the separated F can be removed by Si with higher affinity to F^-，participating in the construction of SEI film

Si—O与杂质反应生产络合物参与SEI膜的构建机理目前还不明确，仍需进一步研究

The mechanism of Si—O reacting with impurities to produce complexes and participating in the construction of SEI film is still unclear， and further research is needed

新型化合物添加剂

Other new compound additives

在极端环境下（如高温高压），亲F^-或亲H⁺型添加剂自身可清除电解液中的HF杂质

The additives can remove HF impurities in the electrolyte by their affinity with F^- or H⁺ under extreme environments （such as high temperature and high potential）

高温高压条件易导致电解液分解产生其它杂质，故在该环境下研究除酸、除水型添加剂较为困难

Electrolyte is easy to decompose to produce other impurities at high temperature and potential， so it is difficult to study acid and water removing additives under this condition